US-based Eisenhower Fellowships calls for applications from Sri Lanka

Wednesday, 3 April 2019 00:00 - - {{hitsCtrl.values.hits}}

Established in honour of former US President Dwight Eisenhower in 1953, the prestigious Eisenhower Fellowship is a unique, individualised seven-week fellowship program aimed at developing a network of outstanding leaders and change agents from across the world.

former US President Dwight Eisenhower

Sri Lanka has been among the limited number of countries that has consistently been represented in the program since its inception.

Past Sri Lankan Eisenhower Fellows are among the most influential voices in the country, and span a wide array of fields including law, politics, banking, technology, urban development, the arts, environment, and medicine.

The selection process for the 2020 Eisenhower Fellowship has now commenced. Applications are currently being sought from persons focused on high impact areas relevant to Sri Lanka including investigative journalism, urban development, police investigation, democratic governance and policy advocacy, the judiciary, education, and environment, among others.

“Acceptance into the Eisenhower Fellowship program is highly competitive. Therefore we are seeking persons who have made outstanding, relevant and timely contributions to the country in their respective fields, and have the potential to have significant impact in Sri Lanka on their return,” said Eisenhower Fellowships Association of Sri Lanka Chairman J.C. Weliamuna. “Our intention is to provide development opportunities and a supportive local and international network for the next generation of Sri Lankan leaders,” he added.

All candidates must submit an online application by 15 May and follow a common selection process. Interested candidates are encouraged to refer to www.efworld.org for more information on the fellowship program and reach out to the Eisenhower Fellowships Association of Sri Lanka at Eisenhower [email protected] for further details and guidance on the application process.